Pixel structure and method for manufacturing the same

ABSTRACT

A method for manufacturing a pixel structure is provided. First, a first mask process is performed to form a patterned first metal layer on a substrate, wherein the patterned first metal layer includes a gate. Next, a second mask process is performed to form a patterned insulating layer and a patterned semiconductor layer over the gate, wherein the patterned insulating layer is disposed on the patterned first metal layer, and the patterned semiconductor layer is disposed on the patterned insulating layer. Then, a third mask process is performed to define a thin film transistor (TFT) and a pixel electrode connected thereto and to form a passivation layer to cover the TFT.

This application claims the benefit of Taiwan application Serial No. 96140832, filed Oct. 30, 2007, the subject matter of which is incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates in general to a pixel structure and a method for manufacturing the same, and more particularly to a pixel structure completed by three mask processes and a method for manufacturing the same.

2. Description of the Related Art

Along with the advance in the technology of planar display, panel manufacturers are seeking new technology to reduce manufacturing cost and further expand market demand. As TFT substrate is the critical element of the panel, how to change the manufacturing process which maintains element quality and at the same time reduces manufacturing cost has become a focus of research and development to panel manufacturers.

Conventionally, manufacturing a TFT substrate needs about four or five photomask processes. Each mask process which includes the steps of depositing material, forming photoresist, exposing, developing and etching, is not only time consuming and also incurs high material cost.

SUMMARY OF THE INVENTION

The invention is directed to a pixel structure and a method for manufacturing the same. According to the invention, the structures of TFT and signal line, and adaptor pad are completed by three mask processes, hence a lot of time and material cost are saved.

According to a first aspect of the present invention, a pixel structure including a thin film transistor (TFT) and a pixel electrode is provided. The TFT disposed on a substrate includes a gate, an insulating layer, a semiconductor layer, a source and a drain. The insulating layer is disposed over the gate. The semiconductor layer is disposed on the insulating layer. The source and the drain are disposed on the semiconductor layer. The pixel electrode is disposed on the substrate and is electrically connected to the TFT. The pixel electrode is a polycrystalline metal oxide.

According to a second aspect of the present invention, a method for manufacturing a pixel structure is provided. First, a first mask process is performed to form a patterned first metal layer on a substrate, wherein the patterned first metal layer includes a gate. Next, a second mask process is performed to form a patterned insulating layer and a patterned semiconductor layer over the gate, wherein the patterned insulating layer is disposed on the patterned first metal layer, and the patterned semiconductor layer is disposed on the patterned insulating layer. Then, a third mask process is performed to define a thin film transistor (TFT) and a pixel electrode connected thereto and to form a passivation layer to cover the TFT

According to a third aspect of the present invention, a method for manufacturing a pixel structure is provided. First, a substrate having a pixel region is provided. Next, a patterned first metal layer is formed on the substrate. Then, an insulating layer and a semiconductor layer are formed, wherein the insulating layer is disposed on the patterned first metal layer within the pixel region, and the semiconductor layer is disposed on the insulating layer. Next, an oxidized metal layer is formed on the substrate to cover the patterned first metal layer, the semiconductor layer, and the insulating layer. Then, a second metal layer is formed on the oxidized metal layer. Next, the oxidized metal layer and the second metal layer are patterned by a halftone mask or a gray-tone mask to form a thin film transistor (TFT), and a data line and a pixel electrode that are coupled to the TFT. Then, a photoresist material is reflowed to form a passivation layer which covers the TFT and the data line.

The invention will become apparent from the following detailed description of the preferred but non-limiting embodiments. The following description is made with reference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a method of manufacturing a pixel structure of the invention;

FIG. 2A is a planar diagram of the first mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention;

FIG. 2B are cross-sectional views along the cross-sectional lines A′ and BB′ of FIG. 2A;

FIG. 3A is a planar diagram of the second mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention;

FIGS. 3B-3E are cross-sectional views along the cross-sectional lines A′ and BB′ of FIG. 3A;

FIG. 4A is a planar diagram of the first step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention;

FIG. 4B are cross-sectional views of manufacturing process along the cross-sectional lines AA′ and BB′ of FIG. 4A;

FIG. 5A is a planar diagram of the second step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention;

FIG. 5B are cross-sectional views of manufacturing process along the cross-sectional lines A′ and BB′ of FIG. 5A;

FIG. 6A is a planar diagram of the third step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention;

FIG. 6B-6D are cross-sectional views of manufacturing process along the cross-sectional lines AA′ and BB′ of FIG. 6A;

FIG. 7A is a planar diagram of the fourth step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention; and

FIGS. 7B-7C are cross-sectional views of manufacturing process along the cross-sectional lines A′ and BB′ of FIG. 7A.

DETAILED DESCRIPTION OF THE INVENTION

Referring to FIG. 1, a method of manufacturing a pixel structure of the invention is shown. Also, referring to FIGS. 2A and 2B. FIG. 2A is a planar diagram of the first mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention. FIG. 2B are cross-sectional views along the cross-sectional lines A′ and BB′ of FIG. 2A. Referring to FIG. 2A. As indicated in step 1, a first mask process is performed, a substrate 10 having a pixel region 10 a is provided to form a patterned first metal layer 100 on the substrate 10. The first mask process as indicated in FIG. 2B includes the following steps. First, a first metal layer (not illustrated) is deposited on the substrate 10. Next, a first patterned photoresist layer (not illustrated) is formed on the first metal layer. Then, the first patterned photoresist layer is used as a photomask, and the first metal layer is etched to form a patterned first metal layer 100 on the substrate 10. As indicated in FIG. 2A, the patterned first metal layer 100 includes a scan line 22, a gate 104 and a scan pad 102 both coupled to the scan line 22, a data pad 108, and a first electrode 106.

Referring to FIGS. 3A-3E. FIG. 3A is a planar diagram of the second mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention. FIG. 3B-3E are cross-sectional views along the cross-sectional lines A′ and BB′ of FIG. 3A. Referring to FIG. 3B, first, an insulating material layer 210 is deposited on the patterned first metal layer 100. Next, a semiconductor material layer 220 is deposited on the insulating material layer 210, wherein the semiconductor material layer 220 includes a semiconductor channel layer 222 and an Ohm contact layer 224, the material of the semiconductor channel layer 222 is amorphous silicon, and the material of the Ohm contact layer 224 is n-type amorphous silicon. Then, a second patterned photoresist layer 230 is formed on the semiconductor material layer 220. The second patterned photoresist layer 230 is formed by a halftone mask or a gray-tone mask and includes a second patterned photoresist layer 230 a having a thickness t1 and a second patterned photoresist layer 230 b having a thickness t2, wherein the second patterned photoresist layer 230 a and the second patterned photoresist layer 230 b are respectively disposed over the gate 104 and the first electrode 106, and the thickness t1 is larger than the thickness t2.

Referring to FIG. 3C. Next, the second patterned photoresist layer 230 is used as a photomask, and the semiconductor layer 220 and the insulating material layer 210 are etched to form a patterned insulating layer 210 a and a patterned semiconductor layer 220 a over the gate 104 and the first electrode 106 respectively, wherein the patterned semiconductor layer 220 a includes a semiconductor channel layer 222 a and an Ohm contact layer 224 a.

Referring to FIG. 3D. Then, the thickness of the second patterned photoresist layer 230 is reduced by ashing process until the second patterned photoresist layer 230 b having the thickness t2 is completely removed to exposed part of the patterned semiconductor layer disposed over the first electrode 106 of the scan line 22 and leave part of the second patterned photoresist layer 230 c with a thickness t3 disposed on the semiconductor layer 220 a over the gate 104.

Next, the patterned semiconductor layer exposed on the scan line 22 (the first electrode 106) is etched to expose the patterned insulating layer 210 a as indicated in FIG. 3E. Then, the remaining second patterned photoresist layer 230 c is removed to form a patterned semiconductor layer 220 b over the gate 104 as indicated in FIG. 3E and FIG. 3A, wherein the patterned semiconductor layer 220 b includes an Ohm contact layer 224 b and a semiconductor channel layer 222 b. As indicated in the step 2 of FIG. 1, in the second mask process, a patterned insulating layer 210 a and a patterned semiconductor layer 220 b are formed, wherein the patterned insulating layer 210 a is disposed on part of the patterned first metal layer 100, and the patterned semiconductor layer 220 b is disposed on the patterned insulating layer 210 a over the gate 104.

Referring to FIGS. 4A and 4B. FIG. 4A is a planar diagram of the first step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention. FIG. 4B is a cross-sectional view of manufacturing process along the cross-sectional lines A′ and BB′ of FIG. 4A. Referring to FIG. 4B. First, an oxidized metal layer 310 is formed on the patterned first metal layer 100, the Ohm contact layer 224 b of the patterned semiconductor layer 220 b, and the patterned insulating layer 210 a. Preferably, the material of the oxidized metal layer 310 is indium tin oxide (ITO). Next, a second metal layer 320 is formed on the oxidized metal layer 310. Then, a third patterned photoresist layer 330 is formed on the second metal layer 320 by a halftone mask or a gray-tone mask, wherein the third patterned photoresist layer 330 includes a third patterned photoresist layer 330 a having a thickness t4 and a third patterned photoresist layer 330 b having a thickness t5, and the thickness t4 is larger than the thickness t5. As indicated in FIG. 4A, the third patterned photoresist layer 330 b, which is thinner, covers a predetermined region of pixel electrode, a scan pad 102 and a data pad 108, and the third patterned photoresist layer 330 a, which is thicker, covers a predetermined region of data line, and a source and a drain of TFT.

Referring to FIGS. 5A and 5B. FIG. 5A is a planar diagram of the second step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention. FIG. 5B is a cross-sectional view of manufacturing process along the cross-sectional lines A′ and BB′ of FIG. 5A. Referring to FIG. 5B, first, the third patterned photoresist layer 330 is used as a photomask and the second metal layer 320 and oxidized metal layer 310 are etched as a patterned second metal layer 320 a and a patterned oxidized metal layer 310 a to expose part of the Ohm contact layer 224 b over the gate 104.

Referring to FIG. 6A-6D. FIG. 6A is a planar diagram of the third step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention. FIGS. 6B-6D are cross-sectional views of manufacturing process along the cross-sectional lines AA′ and BB′ of FIG. 6A. Referring to FIG. 6B, first, the exposed part of the Ohm contact layer 224 b is etched to form an Ohm contact layer 224 c and expose the semiconductor channel layer 222 b.

Referring to FIG. 6C. Next, the thickness of the third patterned photoresist layer 330 is reduced by ashing process until the third patterned photoresist layer 330 b having thickness t5 is completely removed to expose the pixel electrode region 28, the scan pad 102, and the patterned second metal layer 320 a over the data pad 108, and leave the third patterned photoresist layer 330 c having a thickness t6. As indicated in FIG. 6A, a TFT 20 and a data line 21 coupled thereto, and a pixel electrode region 28 including a second metal layer 320 a and an oxidized metal layer 310 a are formed.

Referring to FIG. 6D. Then, the remaining third patterned photoresist layer 330 c is melted by heat to reflow and form a passivation layer 340. The passivation layer 340 covers the TFT 20 and the data line 21.

Referring to FIGS. 7A-7C. FIG. 7A is a planar diagram of the fourth step of the third mask process of a method of manufacturing a pixel structure according to a preferred embodiment of the invention. FIGS. 7B-7C are cross-sectional views of manufacturing process along the cross-sectional lines A′ and BB′ of FIG. 7A. Referring to FIG. 7B. First, the oxidized metal layer 310 a is crystallized as a polycrystalline metal oxide 310 b, wherein the temperature for crystallizing the oxidized metal layer 310 a is higher than 200° C.

Referring to FIG. 7C. Next, the exposed part of the patterned second metal layer 320 a is etched to expose polycrystalline pixel electrodes 30 and 32, wherein the pixel electrode 32 partly covers the insulating layer 210 a of the scan line 22. Also, referring to FIG. 7A. A storage capacitor is constructed by the first electrode 106, the insulating layer 210 a and a second electrode 40, wherein the second electrode 40 is part of another pixel electrode 32. The TFT 20 includes the gate 104, the insulating layer 210 a, the semiconductor channel layer 222 b, the Ohm contact layer 224 c, and the source 20 a and the drain 20 b. The insulating layer 210 a is disposed over the gate 104. The semiconductor channel layer 222 b and the Ohm contact layer 224 c are disposed on the insulating layer 210 a. The source 20 a and the drain 20 b are disposed on the Ohm contact layer 224 c. The pixel electrode 30 is electrically connected to TFT 20. The scan line 22 is electrically connected to the gate 104. The data line 21 is electrically connected to the source 20 a. The data line 21 is formed by part of the second metal layer and part of polycrystalline oxidized metal layer, and the passivation layer 340 formed by a photoresist material also covers the data line 21. The TFT 20 also includes a polycrystalline oxidized metal layer disposed between the Ohm contact layer 224 c and the source 20 a and the drain 20 b. The polycrystalline oxidized metal layer at the drain 20 b is electrically connected to the pixel electrode 30, and the polycrystalline oxidized metal layer and the pixel electrode 30 at the drain 20 b is formed by the same film layer. The pixel structure of the invention includes polycrystalline conductive material, hence having better conductivity than conventional pixel structure. Refer to both FIG. 7A and FIG. 7C. As indicated in the step 3 of FIG. 1, in the third mask process, the TFT 20 as well as the pixel electrode 30 coupled to the TFT 20, and the second electrode 40 are defined, and the passivation layer 340 is formed to cover the TFT 20.

According to the pixel structure and the method for manufacturing the same disclosed in the above embodiment of the invention, only three mask processes are required to complete the structures of TFT and signal line, and signal line adaptor pad of a pixel structure. As the manufacturing process of the invention saves a lot of time and material, the overall manufacturing cost and manufacturing time are reduced.

While the invention has been described by way of example and in terms of a preferred embodiment, it is to be understood that the invention is not limited thereto. On the contrary, it is intended to cover various modifications and similar arrangements and procedures, and the scope of the appended claims therefore should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements and procedures. 

1. A method for manufacturing a pixel structure, the method comprising: (a) performing a first mask process to form a patterned first metal layer on a substrate, wherein the patterned first metal layer comprises a gate; (b) performing a second mask process to form a patterned insulating layer and a patterned semiconductor layer over the gate, wherein the patterned insulating layer is disposed on the patterned first metal layer, and the patterned semiconductor layer is disposed on the patterned insulating layer; and (c) performing a third mask process to define a thin film transistor (TFT) and a pixel electrode coupled to the TFT and to form a passivation layer which covers the TFT.
 2. The manufacturing method according to claim 1, wherein the step (a) comprises: depositing a first metal layer on the substrate; forming a first patterned photoresist layer on the first metal layer; using the first patterned photoresist layer as a photomask and etching the first metal layer to form the patterned first metal layer.
 3. The manufacturing method according to claim 1, wherein the step (b) comprises: depositing an insulating material layer on the patterned first metal layer; depositing a semiconductor layer on the insulating material layer; forming a second patterned photoresist layer on the semiconductor layer, wherein the second patterned photoresist layer has a first thickness and a second thickness, and the first thickness is larger than the second thickness; using the second patterned photoresist layer as a photomask and etching the semiconductor layer and the insulating material layer to form the patterned insulating layer and the patterned semiconductor layer; removing the second patterned photoresist layer having the second thickness by an ashing process to expose part of the patterned semiconductor layer; etching the exposed part of the patterned semiconductor layer; and removing the remaining second patterned photoresist layer.
 4. The manufacturing method according to claim 1, wherein the patterned semiconductor layer comprises a semiconductor channel layer and an Ohm contact layer disposed on the semiconductor channel layer, the step (c) comprises: forming an oxidized metal layer on the Ohm contact layer; forming a second metal layer on the oxidized metal layer; forming a third patterned photoresist layer on the second metal layer, wherein the third patterned photoresist layer has a third thickness and a fourth thickness, and the third thickness is larger than the fourth thickness; using the third patterned photoresist layer as a photomask and etching the second metal layer and the oxidized metal layer to expose part of the Ohm contact layer; and etching the exposed part of the Ohm contact layer.
 5. The manufacturing method according to claim 4, wherein the step (c) further comprises: removing the third patterned photoresist layer having the fourth thickness by an ashing process to expose part of the second metal layer; and reflowing the remaining third patterned photoresist layer to form the passivation layer.
 6. The manufacturing method according to claim 5, wherein the step (c) further comprises: crystallizing the oxidized metal layer as a polycrystalline metal oxide; and etching the exposed part of the second metal layer to form a source and a drain of the TFT and expose part of the oxidized metal layer as the pixel electrode.
 7. The manufacturing method according to claim 6, wherein the temperature for crystallizing the oxidized metal layer is higher than 200° C. 